Materials Science and Engineering

Chitosan Photoresist

Chitosan Base Photoresist

 Chitosan Photoresist project image
Chitosan photoresist spin-coated Glass Sample

Project Description:

Group Name: 

Team Chitosan

 

Students’ Name: 

Huda Kemal, Hannah Kriney, Zachery Meehan, Enoch Oluwaboro, Kim Taylor

 

Project Description: 

This project focuses on the development of a bio-based photoresist formulated from chitosan, a biopolymer sourced from seafood waste. Photoresists are organic polymers used to transfer patterns in microfabrication through changes in UV exposure. Conventional photoresists depend on toxic chemicals that pose significant environmental risks; chitosan presents a sustainable alternative for microfabrication processes. Viscosity measurements, spin-coating thickness modeling, and UV-Vis spectroscopy were computed to examine the material’s behavior. Beer-Lambert’s Law, the Mack model, and the Cauchy model supported our understanding of the material’s properties and response. A resolution testing mask and a development rate analysis as a function of exposure dose were designed to characterize the lithographic performance of the synthesized organic resist. Future research could focus on engineering the photosensitivity and development rate of the resist to improve resolution, roughness, and uniformity of devices created with this bio-based resist. 

Advisor/Instructor:

Dr. Raymond Phaneuf

Sponsor:

MSE

Team Members:

Huda Kemal Materials Science and Engineering
Hannah Kriney Materials Science and Engineering
Zachery Meehan Materials Science and Engineering
Enoch Oluwaboro Materials Science and Engineering
Kim Taylor Materials Science and Engineering

Poster:

Poster_pdf.pdf (853.56 KB)

Table #:

C21
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